Ntụkwasị obi anụ ahụ (Vapor Deposition, PVD) teknụzụ na-ezo aka iji ụzọ anụ ahụ n'okpuru ọnọdụ oghere iji mee ka elu nke isi iyi ( siri ike ma ọ bụ mmiri mmiri) banye n'ime atom ma ọ bụ molecules gaseous, ma ọ bụ n'ime akụkụ ionize n'ime ion, ma gafere gas dị ala (ma ọ bụ plasma). Usoro, teknụzụ maka itinye ihe nkiri dị mkpa nke nwere ọrụ pụrụ iche n'elu mkpụrụ osisi, na ntinye ikuku anụ ahụ bụ otu n'ime teknụzụ ọgwụgwọ kachasị elu. PVD (anụ ahụ vepor deposition) mkpuchi mkpuchi bụ tumadi kewara ụzọ atọ: agụụ evaporation mkpuchi, agụụ sputtering mkpuchi na agụụ ion mkpuchi.
A na-ejikarị ngwaahịa anyị eme ihe na ikuku evaporation na mkpuchi sputtering. Ngwaahịa a na-eji na-etinye ego na-agụnye waya tungsten strand, tungsten ụgbọ mmiri, molybdenum ụgbọ mmiri, na ụgbọ mmiri tantalum ngwaahịa ndị a na-eji na mkpuchi electron beam bụ cathode tungsten waya, ọla kọpa crucible, tungsten crucible, na molybdenum nhazi akụkụ Ngwaahịa na-eji sputtering mkpuchi gụnyere titanium targets, chromium-aluminom targets, titanium targets.
