Metal Rotary Target
A na-etinye oghere ndọta orthogonal na eletrik n'etiti ebumnuche sputtering (cathode) na anode.Ma jupụta gas inert achọrọ (na-abụkarị Ar gas) n'ime ọnụ ụlọ dị elu.N'okpuru ọrụ nke ọkụ eletrik, Ar gas na-ionized n'ime nti ion na electrons.A na-etinye ụfọdụ voltaji dị elu na-adịghị mma na ihe mgbaru ọsọ ahụ, electrons na-apụta site na ihe mgbaru ọsọ na-emetụta mpaghara magnetik, ohere nke ionization nke gas na-arụ ọrụ na-abawanye, a na-emepụta plasma dị elu n'akụkụ cathode, na Ar ion na-emetụta ya. site n'ike Lorentz.Wee mee ngwangwa iji fega n'elu ebe a na-eche ihu, na bombard elu nke e lekwasịrị anya na oke ọsọ ọsọ, nke mere na atom ndị na-agbapụta na ebumnuche na-agbaso ụkpụrụ nke ntụgharị ọkụ ọkụ, si n'elu ebe a na-eche ihu gaa na mkpụrụ, ma tinye ihe nkiri ike dị elu.
Iji meziwanye ọnụego ojiji nke ihe ezubere iche, a na-emepụta cathode na-atụgharị nke nwere arụmọrụ dị elu, a na-eji ihe ezubere iche tubular maka mkpuchi sputtering.Ọganihu nke akụrụngwa sputtering chọrọ ka a gbanwee ebumnuche ya site na ọdịdị dị larịị gaa na ụdị tubular, yana ọnụego ojiji nke ebumnuche ntụgharị tubular nwere ike ịdị elu ruo 70%, nke na-edozi nsogbu nke iji obere ebumnuche eme ihe.
Aha ngwaahịa | Metal rotary target |
Ihe onwunwe | W, Mo, Ta, Ni, Ti, Zr, Cr, TiAl |
Nha ire ere ọkụ | ID-133/ OD-157x 3191mm ID-133/OD-157 X 3855mm ID-160/OD-180x1800mm Enwere ike ịhazi ya dịka ihe achọrọ nke ndị ahịa |
MOQ | 3 iberibe |
ngwugwu | Akpa osisi ply |
Mara: Anyị na-emepụtakarị ihe nleba anya igwe dị iche iche, biko kpọtụrụ anyị maka nkọwa.
Ngwa
Mkpuchi sputtering bụ ụdị ọhụrụ nke usoro mkpuchi vepo anụ ahụ.E jiri ya tụnyere usoro mkpuchi evaporation, ọ nwere uru doro anya
n'ọtụtụ akụkụ.A na-eji ihe ndị e ji agbasa ígwè mee ihe n'ọtụtụ ebe.Ngwa bụ isi nke ebumnuche ntụgharị.
■Mkpụrụ ndụ anyanwụ
■Iko ihe owuwu
■Ugogbe akpaaka
■Semiconductor
■Igwe onyonyo dị larịị, wdg
Ozi ịtụ
Ajụjụ na iwu kwesịrị ịgụnye ozi ndị a:
☑Ntụpụta ebumnuche ebumnuche × OD × L (mm).
☑Ọnụọgụ achọrọ.
☑Biko kpọtụrụ anyị maka mkpa pụrụ iche ọzọ.