Metal Rotary Target
A na-etinye oghere ndọta orthogonal na eletrik n'etiti ebumnuche sputtering (cathode) na anode.Ma jupụta gas inert achọrọ (na-abụkarị Ar gas) n'ime ọnụ ụlọ dị elu.N'okpuru ọrụ nke ọkụ eletrik, Ar gas na-ionized n'ime nti ion na electrons.A na-etinye ụfọdụ voltaji dị elu na-adịghị mma na ihe mgbaru ọsọ ahụ, electrons na-apụta site na ihe mgbaru ọsọ na-emetụta mpaghara magnetik, ohere nke ionization nke gas na-arụ ọrụ na-abawanye, a na-emepụta plasma dị elu n'akụkụ cathode, na Ar ion na-emetụta ya. site n'ike Lorentz.Wee mee ngwangwa iji fega n'elu ebe a na-eche ihu, na bombard elu nke e lekwasịrị anya na oke ọsọ ọsọ, nke mere na atom ndị na-agbapụta na ebumnuche na-agbaso ụkpụrụ nke ntụgharị ọkụ ọkụ, si n'elu ebe a na-eche ihu gaa na mkpụrụ, ma tinye ihe nkiri ike dị elu.
Iji meziwanye ọnụego ojiji nke ihe ezubere iche, a na-emepụta cathode na-atụgharị nke nwere arụmọrụ dị elu, a na-eji ihe ezubere iche tubular maka mkpuchi sputtering.Ọganihu nke akụrụngwa sputtering chọrọ ka a gbanwee ebumnuche ya site na ọdịdị dị larịị gaa na ụdị tubular, yana ọnụego ojiji nke ebumnuche ntụgharị tubular nwere ike ịdị elu ruo 70%, nke na-edozi nsogbu nke iji obere ebumnuche eme ihe.
Aha ngwaahịa | Metal rotary target |
Ihe onwunwe | W, Mo, Ta, Ni, Ti, Zr, Cr, TiAl |
Nha ire ere ọkụ | ID-133/ OD-157x 3191mm ID-133/OD-157 X 3855mm ID-160/OD-180x1800mm Enwere ike ịhazi ya dịka ihe achọrọ nke ndị ahịa |
MOQ | 3 iberibe |
ngwugwu | Akpa osisi ply |
Ngwa
Mkpuchi sputtering bụ ụdị ọhụrụ nke usoro mkpuchi vepo anụ ahụ.E jiri ya tụnyere usoro mkpuchi evaporation, ọ nwere uru doro anya
n'ọtụtụ akụkụ.A na-eji ihe ndị e ji agbasa ígwè mee ihe n'ọtụtụ ebe.Ngwa bụ isi nke ebumnuche ntụgharị.
■Mkpụrụ ndụ anyanwụ
■Iko ihe owuwu
■Ugogbe akpaaka
■Semiconductor
■Igwe onyonyo dị larịị, wdg
Ozi ịtụ
Ajụjụ na iwu kwesịrị ịgụnye ozi ndị a:
☑Ntụpụta ebumnuche ebumnuche × OD × L (mm).
☑Ọnụọgụ achọrọ.
☑Biko kpọtụrụ anyị maka mkpa pụrụ iche ọzọ.